SMT SAM columns from SMT are based on the self-assembled monolayer (SAM) technique. This bonding technique allows ordered monolayers of functional groups. This is also called "horizontal polymerisation", due to Si-O-Si bonds running parallel to the silica surface. As a result, a higher ligand density can be achieved compared to conventional "vertical polymerization".
This SAM technology is available for reversed phase, ion exchange, affinity, chiral chromatography as well as for UHPLC.
Phase | Modification | Particle size | Pore size | Surface area | Carbon content | USP Code |
SAM-C18 OD | C18 | 3, 5, 10 μm
5, 10 μm
5 μm | 100 Å
300 Å
60 Å | 340 m²/g
90 m²/g
N/A | 24 %C
8 %C
N/A | L1 |
SAM-C18 ODL | C18 | 3, 5, 10 μm
5 μm | 100 Å
300 Å | 340 m²/g
90 m²/g | 12 %C
4 %C | L1 |
SMT Elite-C18 | C18 | 5, 10 μm | 100 Å | 340 m²/g | 16 %C | L1 |
SAM-C8 O | C8 | 3, 5, 10 μm
5, 10 μm
5 μm | 100 Å
300 Å
60 Å | 340 m²/g
90 m²/g
N/A | 12 %C
5 %C
N/A | L7 |
SAM-C8 OL | C8 | 3, 5, 10 μm
5, 10 μm | 100 Å
300 Å | 340 m²/g
90 m²/g | 6 %C
2 %C | L7 |
SMT Elite-C8 | C8 | 5, 10 μm | 100 Å | 340 m²/g | 8 %C | L7 |
SMT MEB1 | C1 | 5 μm
5 μm | 100 Å
300 Å | 340 m²/g
90 m²/g | 1 %C
0.6 %C | L13 |
SMT MEB2 | C2 | 5 μm
5 μm | 100 Å
300 Å | 340 m²/g
90 m²/g | 2 %C
1 %C | L30 |
SMT MEB4 | C4 | 5 μm
5 μm | 100 Å
300 Å | 340 m²/g
90 m²/g | 4 %C
2 %C | L26 |
SMT Phen1 | Ph (one per ligand) | 5, 10 μm
5, 10 μm | 100 Å
300 Å | 340 m²/g
90 m²/g | 7.1 %C
3.1 %C | L11 |
SMT Phen2 | Ph (two per ligand) | 5, 10 μm
5, 10 μm | 100 Å
300 Å | 340 m²/g
90 m²/g | 8.4 %C
3.6 %C | L11 |
SMT PhenH | Ph-hexyl | 3, 5, 10 μm
5, 10 μm | 100 Å
300 Å | 340 m²/g
90 m²/g | 7.1 %C
3.1 %C | N/A |
SMT SAM C3 | C3 | 5 µm
5 µm | 100 Å
300 Å | 340 m²/g
90m²/g | 6.5 %C
3.6 %C | N/A |
SMT SAM C5 [Pen] | C5 | 5 µm
5 µm | 100 Å
300 Å | 340 m²/g
90 m²/g | 6.5 %C
3.6 %C | N/A |
SMT SAM C6 [Hex] | C6 | 5 µm
5 µm | 100 Å
300 Å | 340 m²/g
90 m²/g | 6.5 %C
3.6 %C | N/A |
SMT SAM C12 [DD] | C12 | 5 µm
5µm | 100 Å
300 Å | 340 m²/g
90 m²/g | 11 %C
5 %C | N/A |
Phase | Modification | Particle size | Pore size | Surface area | USP Code |
SMT SAX | quaternary amine | 5, 10 μm
5, 10 μm | 100 Å
300 Å | 340 m²/g
90 m²/g | L14 |
SMT WAX | polyethyleneimine | 5, 10 μm
5, 10 μm | 100 Å
300 Å | 340 m²/g
90 m²/g | N/A |
SMT DEAE | di-ethyl-amino-ethyl | 5, 10 μm
5, 10 μm | 100 Å
300 Å | 340 m²/g
90 m²/g | N/A |
SMT SCX | sulfonic acid | 5, 10 μm
5, 10 μm | 100 Å
300 Å | 340 m²/g
90 m²/g | L9, L52 |
SMT WCX | carboxylic acid | 5, 10 μm
5, 10 μm | 100 Å
300 Å | 340 m²/g
90 m²/g | N/A |
Phase | Modification | Particle size | Pore size | Surface area | Carbon content | USP Code |
SMT CIB-ProteinA | ProteinA | 5, 10 μm | 100 Å | N/A | N/A | N/A |
SMT CIB-IgG | IgG | 5, 10 µm | 100 Å | N/A | N/A | N/A |
Phase | Modification | Particle size | Pore size | Surface area | Carbon content | USP Code |
SMT ChiralSep1 | N/A | 5, 10 μm
5, 10 µm | 100 Å
300 Å | N/A | N/A | N/A |
SMT ChiralSep2 | N/A | 5, 10 µm
5, 10 µm | 100 Å
300 Å | N/A | N/A | N/A |
Phase | Modification | Particle size | Pore size | Surface area | Carbon content | USP Code |
SMT SAM-C18 | C18 | 1.5, 1.8 μm | 100 Å | N/A | N/A | N/A |
SMT SAM-C8 | C8 | 1.5, 1.8 µm | 100 Å | N/A | N/A | N/A |